ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED COATINGS ON LIDS AND NOZZLES

PROBLEM TO BE SOLVED : To provide chamber lids and chamber nozzles having a plasma resistant protective layer of chamber component thin film for a processing chamber. SOLUTION : A plasma resistant rare earth oxide film comprises : a ceramic body with at least one surface having a first average surface roughness of 8 to 16 micro inch; and a conformal protective layer over at least one surface of the ceramic body, the conformal protective layer comprising 40 to 100 mol% of Y2O3, 0 to 60 mol% of ZrO2, and 0 to 10 mol% of Al2O3. The conformal protective layer has a uniform thickness of less than 300 μm over the at least one surface and has a second average surface roughness of 10 micro inch or less. A chamber component for a processing chamber has a second average surface roughness that is smaller than a first surface roughness thereof. SELECTED DRAWING : Figure 6 COPYRIGHT : (C)2018, JPO&INPIT